Tuesday, 19 November 2002
D0427

This presentation is part of : Display Presentations, Section F. Crop Protection Entomology

A comparison of pesticide residues found in two peach pest management systems

George C Hamilton, Rutgers University, Department of Entomology, 93 Lipman Drive, New Brunswick, NJ, Peter W. Shearer, Rutgers University, Rutgers Agricultural Research and Extension Center, 121 Northville Road, Bridgeton, NJ, Dean Polk, Rutgers University, Rutgers Fruit Research and Development Center, 283 Rt 539, Cream Ridge, NJ, and Roy Meyer, New Jersey Department of Environmental Protection, Pesticide Control Program, P.O. Box 225, Trenton, NJ.

In response to the possible loss of organophosphate insecticides needed to control key peach pests, a reduced risk pest management system utilizing ground cover management to control tarnished plant bug and mating disruption to control Oriental fruit moth has been developed and implemented in New Jersey peach orchards. Use of this program has resulted in a 50% drop in insecticide use and should reduce the exposure risks from pesticide residues to growers, applicators, field laborers and consumers. The latter impact, however, has not been documented. The objective of this study was to compare the pesticide residues found in conventionally managed peach orchards to those found in orchards using the reduced risk pest management program during the 2001 and 2002 growing seasons. Results from the 2001 growing season indicate that, while the residues found in both systems were below established tolerances, the residue levels found in the reduced risk pest management program were lower than those found in conventionally managed orchards. The results found during 2002 growing season will also be presented.

Species 1: Lepidoptera Tortricidae Grapholita molesta (Oriental Fruit Moth)
Species 2: Heteroptera Miridae Lygus lineolaris (tarnished plant bug)
Keywords: organophosphates, reduced risk

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